A new RuO4 solvent solution for pure ruthenium film depositions

Microelectronic Engineering

Volumn 83, Issue 11-12, 2006, Pages 2248-2252

  Gatineau, Julien ^a   Yanagita, Kazutaka ^a   Dussarrat, Christian ^a  

^a AIR LIQUIDE   (France)

Author keywords

ALD; CVD; Deposition; Ruthenium; Ruthenium oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SUBSTRATES; THIN FILMS; TOXICITY;

ATOMIC LAYER DEPOSITION (ALD); CO-REACTANTS; RUTHENIUM TETROXIDE;

RUTHENIUM COMPOUNDS;

EID: 33751211568     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.013     Document Type: Article

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