Transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering at low temperature

Applied Surface Science

Volumn 256, Issue 1, 2009, Pages 289-293

  Bie, X ^a   Lu, J G ^a   Gong, L ^a   Lin, L ^a   Zhao, B H ^a   Ye, Z Z ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

DC magnetron sputtering; Low temperature; Transparent conductive films; ZnO:Ga

Indexed keywords

GALLIUM COMPOUNDS; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SUBSTRATES; TEMPERATURE; TRANSPARENT ELECTRODES; ZINC OXIDE;

DC MAGNETRON SPUTTERING; DC REACTIVE MAGNETRON SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; LOW TEMPERATURES; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVE ELECTRODES; TRANSPARENT CONDUCTIVE FILMS; WIDE TEMPERATURE RANGES;

CONDUCTIVE FILMS;

EID: 70349758073     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.08.018     Document Type: Article

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