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Volumn 257, Issue 17, 2011, Pages 7900-7905
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Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films
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Author keywords
AFM; Atomic layer deposition; Hardness; Nanoindentation; XRD; ZnO thin films
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
ATOMIC LAYER DEPOSITION;
ELASTIC MODULI;
HARDNESS;
II-VI SEMICONDUCTORS;
MECHANICAL PROPERTIES;
METALLIC FILMS;
MICROSTRUCTURE;
NANOINDENTATION;
OPTICAL FILMS;
SILICON COMPOUNDS;
X RAY DIFFRACTION;
ZINC OXIDE;
ANNEALING TEMPERATURES;
FILM SURFACES;
HALL-PETCH EQUATION;
OPTICAL AND MECHANICAL PROPERTIES;
ORDERED MICROSTRUCTURES;
PHOTOLUMINESCENCE SPECTRUM;
UV EMISSIONS;
ZNO THIN FILM;
THIN FILMS;
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EID: 79957497908
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2011.04.088 Document Type: Article |
Times cited : (58)
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References (33)
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