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Volumn 257, Issue 17, 2011, Pages 7900-7905

Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

Author keywords

AFM; Atomic layer deposition; Hardness; Nanoindentation; XRD; ZnO thin films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ELASTIC MODULI; HARDNESS; II-VI SEMICONDUCTORS; MECHANICAL PROPERTIES; METALLIC FILMS; MICROSTRUCTURE; NANOINDENTATION; OPTICAL FILMS; SILICON COMPOUNDS; X RAY DIFFRACTION; ZINC OXIDE;

EID: 79957497908     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.04.088     Document Type: Article
Times cited : (58)

References (33)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.