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Nanoscale Research Letters

Volumn 5, Issue 6, 2010, Pages 935-940

Berkovich nanoindentation on AlN thin films

(3) Jian, Sheng Rui a Chen, Guo Ju a Lin, Ting Chun a

a I SHOU UNIVERSITY (Taiwan)

Author keywords

AlN; Focused ion beam; Nanoindentation; Transmission electron microscopy

Indexed keywords

ALN; ALN THIN FILMS; CONTACT STIFFNESS; CROSS-SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DISLOCATION NUCLEATION; FABRICATION PROCESS; FOCUSED ION BEAM MILLING; GAN TEMPLATE; HELICON SPUTTERING; INDENTERS; LOAD-DISPLACEMENT CURVE; MECHANICAL DAMAGES; MECHANICAL DEFORMATION; METAL-ORGANIC; MOCVD; NANOINDENTERS; PRESSURE-INDUCED PHASE TRANSITION; YOUNG'S MODULUS;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELASTIC MODULI; ELASTICITY; FOCUSED ION BEAMS; GALLIUM NITRIDE; HARDNESS; IONS; NANOINDENTATION; ORGANIC CHEMICALS; PHASE TRANSITIONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; UNLOADING;

SCANNING ELECTRON MICROSCOPY;

EID: 77953025712 PISSN: 19317573 EISSN: 1556276X Source Type: Journal
DOI: 10.1007/s11671-010-9582-5 Document Type: Article

Times cited : (65)

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