Recent progress in developing an extreme ultraviolet full-field exposure tool at Selete

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Tawarayama, Kazuo ^a   Aoyama, Hajime ^a   Magoshi, Shunko ^a   Tanaka, Yuusuke ^a   Shirai, Seiichiro ^a   Tanaka, Hiroyuki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUVL; Extreme ultraviolet lithography; Overlays; Resist printing

Indexed keywords

ALIGNMENT; EXPERIMENTS; EXTREME ULTRAVIOLET LITHOGRAPHY;

ALIGNMENT MARKS; CD UNIFORMITY; DYNAMIC EXPOSURE; EXPOSURE TOOL; EXTREME ULTRAVIOLET; FULL-FIELD; GLOBAL ALIGNMENT; LINE-AND-SPACE; LINEAR CORRECTIONS; LITHOGRAPHY TOOLS; NUMERICAL APERTURE; OVERLAY ACCURACY; QUALITY LEVELS; RECENT PROGRESS; RESIST PRINTING; TEST SITE;

EXPOSURE METERS;

EID: 80055096993     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3275786     Document Type: Article

References (17)

1. P. P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, G. Jones, C. Koh, B. La Fontaine, B. McClinton, R. Miyakawa, W. Montgomery, J. Roller, T. Wallow, and S. Wurm, "The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm mode and beyond," Proc. SPIE 7271, 72710W (2009).
2. J. M. Roberts, T. Bacuita, R. L. Bristol, H. B. Cao, M. Chandhok, S. H. Lee, E. M. Panning, M. Shell, G. Zhang, and B. J. Rice, "One small step: world's first integrated EUVL process line," Proc. SPIE 5751, 64-77 (2005). (Pubitemid 41275375)
3. A. M. Goethals, R. Jonckheere, G. F. Lorusso, J. Hermans, F. Van Roey, A. Miers, M. Chandhok, I. Kim, A. Niroomand, F. Iwamoto, N. Stepanenko, R. Gronheid, B. Baudemprez, and K. Ronse, "EUV lithography program at IMEC," Proc. SPIE 6517, 651709 (2007).
4. S. Wurm, "Extreme ultraviolet lithography development in the United States," Jpn. J. Appl. Phys. 46, 6105-6112 (2007). (Pubitemid 47463403)
5. I. Mori, O. Suga, H. Tanaka, I. Nishiyama, T. Terasawa, H. Shigemura, T. Taguchi, T. Tanaka, and T. Itani, "Selete's EUV program: progress and challenges," Proc. SPIE 6921, 692102 (2008).
6. S. Uzawa, H. Kubo, Y. Miwa, T. Tsuji, and H. Morishima, "Path to the HVM in EUVL through the development and evaluation of the SFET," Proc. SPIE 6517, 651708 (2007).
7. N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, "Study of system performance in SFET," Proc. SPIE 6921, 69211C (2008).
8. K. Tawarayama, S. Magoshi, H. Aoyama, Y. Tanaka, S. Shirai, and H. Tanaka, "Evaluation result of Selete's exposure tool: impact of the source performance," Proc. SPIE 6921, 69212V (2008).
9. K. Tawarayama, S. Magoshi, Y. Tanaka, S. Shirai, and H. Tanaka, "Extreme ultraviolet lithography using small-field exposure tool: current status," Jpn. J. Appl. Phys. 47, 4866-4871 (2008).
10. Y. Tanaka, H. Aoyama, K. Tawarayama, S. Magoshi, S. Shirai, and H. Tanaka, "Effects of aberration and flare on lithographic performance of SFET," Proc. SPIE 6921, 69211D (2008).
11. H. Aoyama, Y. Tanaka, T. Kamo, N. Iriki, Y. Arisawa, and T. Tanaka, "Flare evaluation for 32-nm half pitch using SFET," Proc. SPIE 6921, 69213H (2008).
12. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, and H. Kawai, "Nikon EUVL development progress update," Proc. SPIE 6921, 69210M (2008).
13. K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatsuda, K. Nomura, and H. Iwata, "Development status of projection optics and illumination optics for EUV1," Proc. SPIE 6921, 69210Q (2008).
14. M. Yoshioka, D. Bolshukhin, G. Hergenhan, J. Kleinschmidt, V. Korobochko, G. Schriever, M. C. Schurmann, C. D. Tran, and C. Ziener, "Progress on Xe-DDP source development for alpha phase," Proc. SPIE 6921, 69210U (2008).
15. D. Kawamura, K. Kaneyama, S. Kobayashi, J. J. S. Santillan, and T. Itani, "EUV resist development in Selete," Proc. SPIE 6923, 692313 (2008).
16. D. Kawamura, Y. Tanaka, T. Itani, E. Soda, and N. Oda, "Pattern transfer process development for EUVL," Proc. SPIE 7273, 72731O (2009).
17. H. Aoyama, K. Tawarayama, Y. Tanaka, D. Kawamura, Y. Arisawa, T. Uno, T. Kamo, T. Tanaka, T. Itani, H. Tanaka, I. Mori, Y. Nakajima, R. Inanami, K. Takai, K. Murano, T. Koshiba, and K. Hashimoto, "Process liability evaluation for EUVL," Proc. SPIE 7271, 727120 (2009).