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Volumn 6921, Issue , 2008, Pages

Nikon EUVL development progress update

Author keywords

EUV exposure tool; EUV pre production tool; EUVA project; EUVL; Extreme ultra violet lithography

Indexed keywords

ARF IMMERSION LITHOGRAPHY; ASPHERIC SURFACES; DEFECT-FREE; DEVELOPMENT RESULTS; ELASTIC EMISSION MACHINING; ENTEGRIS; EUV LIGHT SOURCES; EUVA PROJECT; EXPOSURE TOOL; EXTREME ULTRAVIOLETS; FINE RESOLUTION; FULL-FIELD; HIGH SENSITIVITY; HIGH-PRECISION; ILLUMINATION OPTICS; IRRADIATION TEST; LINE EDGE ROUGHNESS; MASK FEATURES; METROLOGY TOOLS; MODULE INSTALLATION; MODULE INTEGRATION; MULTI-LAYER-COATING; POLISHING TECHNOLOGY; PRE-PRODUCTION; PROCESS DEVELOPMENT; PROJECTION OPTICS; TOOL DEVELOPMENT;

EID: 47849128858     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772444     Document Type: Conference Paper
Times cited : (43)

References (2)
  • 2
    • 35148853141 scopus 로고    scopus 로고
    • T.Miura, et al., Proc SPIE, 6517, 651707 (2007).
    • (2007) Proc SPIE , vol.6517 , pp. 651707
    • Miura, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.