|
Volumn 6921, Issue , 2008, Pages
|
Nikon EUVL development progress update
|
Author keywords
EUV exposure tool; EUV pre production tool; EUVA project; EUVL; Extreme ultra violet lithography
|
Indexed keywords
ARF IMMERSION LITHOGRAPHY;
ASPHERIC SURFACES;
DEFECT-FREE;
DEVELOPMENT RESULTS;
ELASTIC EMISSION MACHINING;
ENTEGRIS;
EUV LIGHT SOURCES;
EUVA PROJECT;
EXPOSURE TOOL;
EXTREME ULTRAVIOLETS;
FINE RESOLUTION;
FULL-FIELD;
HIGH SENSITIVITY;
HIGH-PRECISION;
ILLUMINATION OPTICS;
IRRADIATION TEST;
LINE EDGE ROUGHNESS;
MASK FEATURES;
METROLOGY TOOLS;
MODULE INSTALLATION;
MODULE INTEGRATION;
MULTI-LAYER-COATING;
POLISHING TECHNOLOGY;
PRE-PRODUCTION;
PROCESS DEVELOPMENT;
PROJECTION OPTICS;
TOOL DEVELOPMENT;
COATINGS;
EXPOSURE METERS;
LIGHT;
LIGHT SOURCES;
OPTICS;
PHOTOLITHOGRAPHY;
ROUGHNESS MEASUREMENT;
SYNCHROTRON RADIATION;
TECHNOLOGY;
UNITS OF MEASUREMENT;
VACUUM;
EQUIPMENT;
|
EID: 47849128858
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.772444 Document Type: Conference Paper |
Times cited : (43)
|
References (2)
|