Study of system performance in SFET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Nishimura, Naosuke ^a   Takahashi, Gaku ^a   Tsuji, Toshihiko ^a   Morishima, Hideki ^a   Kajiyama, Kazuhiko ^a   Uzawa, Shigeyuki ^a  

^a CANON INC   (Japan)

Author keywords

Dose uniformity; EUV exposure tools; SFET; System performance

Indexed keywords

DOSE UNIFORMITY; EXPOSURE SENSITIVITY; EXPOSURE TESTS; EXPOSURE TOOL; FIELD EXPOSURE; LEADING EDGE TECHNOLOGY; RESIST DEVELOPMENT; SFET; SYNCHRONIZATION ERROR; SYSTEM PERFORMANCE;

EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS;

LIGHT SOURCES;

EID: 67149102578     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771952     Document Type: Conference Paper

References (3)

1. Shigeyuki Uzawa et al, "Path to the HVM in EUVL through the Development and Evaluation of the SFET" of SPIE 6517-07(2007)..
2. Hiroyuki, Tanaka, 2007 Int. EUVL sympo., ET-03(2007).
3. Kazuo, Tawarayama, 2007 Int. EUVL sympo., ET-P05(2007).