One small step: World's first integrated EUVL process line

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 64-77

  Roberts, Jeanette M ^a   Bacuita, Terence ^a   Bristol, Robert L ^a   Cao, Heidi B ^a   Chandhok, Manish ^a   Lee, Sang H ^a   Panning, Eric M ^a   Shell, Melissa ^a   Zhang, Guojing ^a   Rice, Bryan J ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUVL; Extreme Ultraviolet Lithography; Micro Exposure Tool

Indexed keywords

EUVL; EXTREME ULTRAVIOLET LITHOGRAPHY; MICRO-EXPOSURE TOOL; MICRO-EXPOSURE TOOL (MET);

PRINTING; PROBLEM SOLVING; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

LITHOGRAPHY; PRINTING; PROBLEM SOLVING; ULTRAVIOLET RADIATION;

EID: 24644442630     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600259     Document Type: Conference Paper

References (12)

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2. "High-resolution EUV Microstepper tool for resist testing & technology evaluation", Malcolm Gower, Adam Brunton. Julian Cashmore, Peter Elbourn, Graeme Elliner, Philipp Grünewald, Mark Harman, Simon Hough, Sandip Mundair, Damian Rees, Pete Richards, Vincent Truffert, Ian Wallhead, and Mike Whitfield, Litho Forum, Los Angeles, CA, (28-29 January, 2004)
3. rd International EUVL Sympsium, Myazaki, Japan, (November, 2004)
4. rd International EUVL Sympsium, Myazaki, Japan, (November, 4 2004)
5. "EUV resist patterning performance from the Intel microexposure tool (MET)", H. B. Cao, W. Yueh, J. M. Roberts, B. J. Rice, R. L. Bristol, and M. Chandhok, Proc. SPIE, Vol. 5753, (2005) [5753-52]
6. th EIPB, San Diego, CA (June 2003)
7. "Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL", Manish Chandhok, Sang H. Lee, Christof Krautschik, Bryan J. Rice, Eric Panning, Michael Goldstein, and Melissa Shell, Proc. SPIE., Vol. 5374, p. 86 (2004)
8. "Size-dependent flare and its effect on imaging", Stephen P. Renwick, Steve D. Slonaker, and Taro Ogata, Proc. SPIE. Vol. 5040, p. 24, (2003)
9. "Comparison of Techniques to Measure the Point Spread Function due to Scatter and Flare in EUV Lithography Systems", M. Chandhok, S. H. Lee, C. Krautschik, G. Zhang, B. J. Rice, M. Goldstein, E. Panning, R. Bristol, A. Stivers, and M. Shell, Proc. SPIE, Vol. 5374, p. 854 (2004)
10. "Flare and lens aberration requirements for EUV lithographic tools", S. H. Lee, M. Chandhok, and Y. Shroff. Proc. SPIE, Vol. 5751, (2005) [5751-34]
11. "Characterization of flare on Intel's EUV MET tool", M. Chandhok, S. H. Lee, E. M. Panning, J. M. Roberts, and H. B. Cao. Proc. SPIE, Vol. 5751, (2005) [5751-31]
12. "SEMI P38-1103 Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks" (http://www.semi.org/PUBS/SEMIPUBS.NSF/ 94fa0e7958a87ffb882565f6000cf3aa!OpenView&Start=38)