Extreme ultraviolet lithography development in the United States

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6105-6112

  Wurm, Stefan ^a  

^a SEMATECH   (United States)

Author keywords

Extreme ultraviolet lithography; Mask blanks; Projection optics; Resist printing; Source collectors

Indexed keywords

MASKS; OPTICS;

MASK BLANKS; PROJECTION OPTICS; RESIST PRINTING; SOURCE COLLECTORS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 34648812981     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6105     Document Type: Article

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