Evaluation results for Selete's exposure tool - Impact of the source performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Tawarayama, Kazuo ^a   Magoshi, Shunko ^a   Aoyama, Hajime ^a   Tanaka, Yuusuke ^a   Shirai, Seiichiro ^a   Tanaka, Hiroyuki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV source; EUVL; Extreme ultraviolet lithography; Pupilgram; Resist printing

Indexed keywords

CD BIAS; ELECTRODE LIFE; EUV SOURCE; EVALUATION RESULTS; EXPOSURE TOOL; EXTREME ULTRAVIOLET; HIGH SENSITIVITY; ILLUMINATION UNIFORMITY; NON-UNIFORM DISTRIBUTION; ON-WAFER; PUPIL FILL; PUPILGRAM; RESIST PATTERN; RESIST PRINTING; SIMULATION RESULT; WAFER SURFACE;

EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; PHOTORESISTS; ULTRAVIOLET DEVICES; XENON;

ELECTRIC DISCHARGES;

EID: 65849120234     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771891     Document Type: Conference Paper

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