Progress on Xe-DPP source development for Alpha phase

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Yoshioka, Masaki ^a   Bolshukhin, Denis ^a   Hergenhan, Guido ^b   Kleinschmidt, Jürgen ^a   Korobochko, Vladimir ^a   Schriever, Guido ^a   Schurmann Max C ^a   Tran, Chinh Duc ^a   Ziener, Christian ^b  

^a XTREME Technologies   (Germany)

^b XTREME Technologies   (Germany)

Author keywords

EUV lithography; EUV sources; Gas discharge produced plasma; Xenon; Z pinch

Indexed keywords

ALPHA PHASE; ANALYSIS RESULTS; COMPONENT RELIABILITY; CONTINUOUS IMPROVEMENTS; CORE TECHNOLOGY; DEBRIS MITIGATION; EUV SOURCE; FIELD DATA; GAS DISCHARGE PRODUCED PLASMA; JOINT DEVELOPMENT; MICRO-EXPOSURE; OPTICAL PERFORMANCE; PHILIPS; PLASMA GENERATION; POWER PERFORMANCE; Z PINCH;

DEBRIS; ELECTRIC DISCHARGES; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; TECHNOLOGY;

XENON;

EID: 79959344405     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772830     Document Type: Conference Paper

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