SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 158, Issue 10, 2011, Pages

Self-affine surface roughness of chemically and thermally cleaned Ge(100) surfaces

(9) Fleischmann, C a Houssa, M a Sioncke, S b Beckhoff, B c Mller, M c Hnicke, P c Meuris, M b Temst, K a Vantomme, A a

a KU LEUVEN (Belgium)

b IMEC (Belgium)

c PHYSIKALISCH TECHNISCHE BUNDESANSTALT (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC DIFFUSIONS; CHARACTERISTIC PARAMETER; CHEMICAL COMPOSITIONS; CLEANING PROCEDURES; CLEANING PROCESS; COMPLEX SURFACE; DESORPTION PROCESS; GE(100) SURFACE; HF SOLUTIONS; ROUGHNESS ANALYSIS; ROUGHNESS EXPONENT; SELF-AFFINE FRACTAL SURFACES; SELF-AFFINE SCALING; SELF-AFFINE SURFACES; SEMI-CONDUCTOR SURFACES; STRONG CONTRAST; SUBMICRON SCALE; SURFACE CHEMICAL COMPOSITION; SURFACE SMOOTHENING; VACUUM-ANNEALING;

CHEMICAL CLEANING; DESORPTION; FRACTALS; GERMANIUM; HYDROFLUORIC ACID; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SURFACE MORPHOLOGY; SURFACE PROPERTIES;

SURFACE ROUGHNESS;

EID: 80052095450 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3624762 Document Type: Article

Times cited : (5)

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