Ambient stability of chemically passivated germanium interfaces

Surface Science

Volumn 543, Issue 1-3, 2003, Pages 63-74

  Bodlaki, D ^a   Yamamoto, H ^a   Waldeck, D H ^a   Borguet, E ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

Germanium; Non linear optical methods; Oxidation; Photoelectron spectroscopy, X ray photoelectron spectroscopy; Second harmonic generation methods; Silicon; Single crystal surfaces; Sulphides; Surface chemical reaction

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; HARMONIC GENERATION; SEMICONDUCTING GERMANIUM; SILICON; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

PASSIVATING LAYER;

INTERFACES (MATERIALS);

EID: 0041328123     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00958-0     Document Type: Article

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