Preparation of clean and atomically flat germanium(001) surfaces

Surface Science

Volumn 440, Issue 1-2, 1999, Pages

  Hovis, Jennifer S ^a   Hamers, Robert J ^a   Greenlief, C Michael ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b UNIVERSITY OF MISSOURI   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL CLEANING; DEGASSING; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; SURFACE CLEANING; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMICALLY FLAT GERMANIUM SURFACE; FLASH ANNEALING; LOW INDEX SINGLE CRYSTAL SURFACES; ULTRAVIOLET GENERATED OZONE; WET CHEMICAL TREATMENT;

SEMICONDUCTING GERMANIUM;

EID: 0033208007     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00866-3     Document Type: Article

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