Carbon contamination free Ge(100) surface cleaning for MBE

Applied Surface Science

Volumn 125, Issue 1, 1998, Pages 125-128

  Okumura, H ^a   Akane, T ^a   Matsumoto, S ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Ge; GeO 2; MBE; Surface cleaning; Wet treatment

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CARBON; CLEANING; CONTAMINATION; DESORPTION; ETCHING; HYDROCHLORIC ACID; MOLECULAR BEAM EPITAXY; OXIDATION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SURFACE STRUCTURE;

PROTECTIVE OXIDE; WET TREATMENT;

SEMICONDUCTING GERMANIUM;

EID: 0032472187     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00587-4     Document Type: Article

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