An X-ray photoelectron spectroscopy study of the HF etching of native oxides on Ge(111) and Ge(100) surfaces

Applied Surface Science

Volumn 123-124, Issue , 1998, Pages 66-70

  Deegan, Terri ^a   Hughes, Greg ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

Germanium; HF; Oxides; Passivation

Indexed keywords

ELECTRON ENERGY LEVELS; ETCHING; HYDROFLUORIC ACID; OXIDES; PASSIVATION; SEMICONDUCTOR GROWTH; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE REGROWTH RATES;

GERMANIUM;

EID: 0002889415     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00511-4     Document Type: Article

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