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Volumn 158, Issue 5, 2011, Pages

Towards passivation of Ge(100) surfaces by sulfur adsorption from a (NH4)2S solution: A combined NEXAFS, STM and LEED study

(12) Fleischmann, C a Sioncke, S b Couet, S a Schouteden, K c Beckhoff, B d Mller, M d Hnicke, P d Kolbe, M d Van Haesendonck, C c Meuris, M b Temst, K a Vantomme, A a

a KU LEUVEN (Belgium)

b IMEC (Belgium)

c UNIVERSITY OF LEUVEN (Belgium)

d PHYSIKALISCH TECHNISCHE BUNDESANSTALT (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; GERMANIUM OXIDES; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; SULFUR; SURFACE CHEMISTRY; X RAY ABSORPTION SPECTROSCOPY;

GE(100) SURFACE; LONG RANGES; PASSIVATED SURFACE; PASSIVATION LAYER; SULFUR ADSORPTION; SULFUR COVERAGE; SULFUR PASSIVATION; SURFACE OXIDE;

PASSIVATION;

EID: 79953197578 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3566846 Document Type: Article

Times cited : (15)

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