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Physical Review B - Condensed Matter and Materials Physics

Volumn 65, Issue 24, 2002, Pages 2453231-2453236

Scaling laws in etched Si surfaces

(2) Dotto, Marta E R a Kleinke, Maurício U a

a UNIVERSITY OF CAMPINAS (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON;

ANISOTROPY; ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; ELASTICITY; GROWTH; GROWTH RATE; KINETICS; MATHEMATICAL ANALYSIS; MATHEMATICAL MODEL; MOLECULAR DYNAMICS; SIMULATION;

EID: 0037098480 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (28)

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