Preparation of high-quality Ge substrate for MBE

Applied Surface Science

Volumn 108, Issue 2, 1997, Pages 303-305

  Akane, T ^a   Tanaka, J ^a   Okumura, H ^a   Matsumoto, S ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ANNEALING; ATOMIC FORCE MICROSCOPY; DESORPTION; ETCHING; HIGH ENERGY ELECTRON DIFFRACTION; MOLECULAR BEAM EPITAXY; OXIDES; SOLUTIONS; SUBSTRATES; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

NATIVE OXIDE; SURFACE UNIFORMITY; ULTRAHIGH VACUUM;

GERMANIUM;

EID: 0031077723     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00854-9     Document Type: Article

References (8)

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