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Journal of Applied Electrochemistry

Volumn 41, Issue 7, 2011, Pages 765-771

Copper electrocrystallization from acidic sulfate electrolyte containing MPS additive

(2) Gu, M a Zhong, Q a

a CHONGQING UNIVERSITY (China)

Author keywords

Chloride ions; Copper electrocrystallization; MPS; PEG

Indexed keywords

ACID SULFATES; CHLORIDE IONS; COPPER DEPOSITION; COPPER ELECTRODEPOSITION; COPPER NUCLEATION; DEPOSITION POTENTIAL; ELECTROCRYSTALLIZATION; GLASSY CARBON ELECTRODES; MPS; NUCLEATION MECHANISM; NUMBER DENSITY; SODIUM SALT; SULFATE ELECTROLYTES; THREE-DIMENSIONAL GROWTH;

CHLORINE COMPOUNDS; CHRONOAMPEROMETRY; CRYSTAL GROWTH; CYCLIC VOLTAMMETRY; ELECTROLYTES; GLASS MEMBRANE ELECTRODES; GLASSY CARBON; GLYCOLS; NUCLEATION; POLYETHYLENE GLYCOLS; SCANNING ELECTRON MICROSCOPY; SODIUM SULFATE;

COPPER;

EID: 80051666345 PISSN: 0021891X EISSN: None Source Type: Journal
DOI: 10.1007/s10800-011-0293-0 Document Type: Article

Times cited : (25)

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