Electrodeposition of Copper in the SPS-PEG-CL Additive System I. Kinetic Measurements: Influence of SPS

Journal of the Electrochemical Society

Volumn 151, Issue 4, 2004, Pages

  Moffat, T P ^a   Wheeler, D ^a   Josell, D ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CHEMICAL VAPOR DEPOSITION; COPPER; CYCLIC VOLTAMMETRY; ELECTROPLATING; FILM GROWTH; MOLECULES; QUENCHING; REACTION KINETICS; RECRYSTALLIZATION (METALLURGY);

ADDITIVE SYSTEM; CHRONOAMPEROMETRIC TRANSIENTS; CURVATURE-ENHANCED ACCELERATORCOVERAGE (CEAC) MECHANISM; METAL DEPOSITION;

ELECTRODEPOSITION;

EID: 2042469471     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1651530     Document Type: Article

References (46)

1. T. P. Moffat, D. Wheeler, W. H. Huber, and D. Josell, Electrochem. Solid-State Lett., 4, C26 (2001).
2. D. Josell, D. Wheeler, W. H. Huber, J. E. Bonevich, and T. P. Moffat, J. Electrochem. Soc., 148, C767 (2001).
3. D. Wheeler, D. Josell, and T. P. Moffat, J. Electrochem. Soc., 150, C302 (2003).
4. B. C. Baker, C. Witt, D. Wheeler, D. Josell, and T. P. Moffat, Electrochem. Solid-State Lett., 6, C67 (2003), and references therein.
5. D. Josell, S. Kim, D. Wheeler, T. P. Moffat, and S. G. Pyo, J. Electrochem. Soc., 150, C368 (2003).
6. G. McFadden, S. R. Coriell, T. P. Moffat, D. Josell, D. Wheeler, W. Schwarzacher, and J. Mallett, J. Electrochem. Soc., 150, C591 (2003).
7. T. P. Moffat, D. Wheeler, C. Witt, and D. Josell, Electrochem. Solid-State Lett., 5, C49 (2002).
8. T. P. Moffat, B. Baker, D. Wheeler, and D. Josell, Electrochem. Solid-State Lett., 6, C59 (2003).
9. M. R. H. Hill and G. T. Rogers, J. Electroanal. Chem. Interfacial Electrochem., 86, 179 (1978).
10. M. Yokoi, S. Konishi, and T. Hayashi, Denki Kagaku oyobi Kogyo Butsuri Kagaku, 52, 218 (1984).
11. J. R. White, J. Appl. Electrochem., 17, 977 (1987).
12. D. Stoyohev and C. Tsvetanov, J. Appl. Electrochem., 26, 741 (1996).
13. G. A. Hope and G. M. Brown, in Electrode Processes, A. Wieokowski and K. Itaya, Editors, PV 96-8, p. 215, The Electrochemical Society Proceedings Series, Pennington, NJ (1996).
14. J. J. Kelly and A. C. West, J. Electrochem. Soc., 145, 3472 (1998).
15. J. J. Kelly and A. C. West, J. Electrochem. Soc., 145, 3477 (1998).
16. M. Yokoi, S. Konishi, and T. Hayashi, Denki Kagaku oyobi Kogyo Butsuri Kagaku, 51,460 (1983).
17. Z. Nagy, J. P. Blaudeau, N. C. Hung, L. A. Curtiss, and D. J. Zurawski, J. Electrochem. Soc., 147, L87 (1995).
18. J. P. Healy, D. Pletcher, and M. Goodenough, J. Electroanal. Chem., 338, 155 (1992).
19. D. M. Soares, S. Wasle, K. Weil, and K. Doblhofer, J. Electroanal. Chem., 532, 353 (2002).
20. T. P. Moffat, J. E. Bonevich, W. H. Huber, A. Stanishevsky, D. R. Kelly, G. R. Stafford, and D. Josell, J. Electrochem. Soc., 147, 4524 (2000).
21. U. Bertocci, Electrochim. Acta, 11, 1261 (1966).
22. A. Molodov, G. N. Markosyan, and V. V. Losev, Electrochim. Acta, 17, 701 (1972).
23. M. Yokoi, S. Konishi, and T. Hayashi, Denki Kagaku oyobi Kogyo Butsuri Kagaku, 51, 310 (1983).
24. E. Gileadi and V. Tsionsky, J. Electrochem. Soc., 147, 567 (2000).
25. A. Jardy, A. Legal Lasalle-Molin, M. Keddam, and H. Takenouti, Electrochim. Acta, 37, 2195 (1992).
26. H. A. Biebuyck, C. D. Bain, and G. M. Whitesides, Langmuir, 10, 1825 (1994).
27. Ch. Jung, O. Dannenberger, Y. Xu, M. Buck, and M. Grunze, Langmuir, 14, 1103 (1998).
28. (a) S. M. Driver and D. P. Woodruff, Surf. Sci., 488, 207 (2001)
29. (b) H. Kondoh, N. Saito, F. Matsui, T. Yokoyama, T. Ohta, and H. Kuroda, J. Phys. Chem. B, 105, 12870 (2001)
30. (c) M. J. Esplandiu, H. Hagenstrom, and D. M. Kolb, Langmuir, 17, 828 (2001)
31. S. G. Malhotra, P. S. Locke, A. H. Simon, J. Fluegel, P. DeHaven, D. G. Hemmes, R. Jackson, and E. Patton, in Advanced Metallization Conference 1999, M. E. Gross, T. Gessner, N. Kobayashi, and Y. Yasuda, Editors, p. 77, MRS. Warrendale, PA (2000).
32. B. Baker, D. Pena, M. Herrick, R. Chowdhury, B. Acosta, C. R. Simpson, and G. Hamilton, in Electrochemical Processing in ULSI Fabrication and Semiconductor/ Metal Deposition II, P. C. Andricacos, P. C. Searson, C. Reidsema-Simpson, P. Allongue, J. L. Slickney, and G. M. Oleszek, Editors, PV 99-9, p. 103, The Electrochemical Society Proceedings Series, Pennington, NJ (1999).
33. P. C. Andricacos, C. Parks, C. Cabral, R. Wachnik, R. Tsai, S. Malhtra, P. Locke, J. Fluegel, J. Horkans, K. Kwietniak, C. Uzoh, K. P. Rodbell, L. Gignac, E. Walton, D. Chung, and R. Geffken, in Electrochemical Processing in ULSI Fabrication and Semiconductor/Metal Deposition II, P. C. Andricacos, P. C. Searson, C. Reidsema-Simpson, P. Allongue, J. L. Stickney, and G. M. Oleszek, Editors, PV 99-9, p. 111, The Electrochemical Society Proceedings Series, Pennington, NJ (1999).
34. T. P. Moffat, D. Wheeler, M. Edelstein, and D. Josell, IBM J. Res. Dev., Submitted.
35. H. Hagenstrom, M. A. Schneeweiss, and D. M. Kolb, Langmuir. 15, 7802 (1999).
36. P. L. Schilardi, O. Azzaroni, and R. C. Salvarezza, Phys. Rev. B, 62, 13098 (2000).
37. D. Roha and U. Landau, J. Electrochem. Soc., 137, 824 (1990).
38. J. Edwards. Trans. Inst. Met. Finish., 41, 169 (1964).
39. D. Stoychev, I. Vitanova, R. Bujukliev, N. Petkova, I. Popova, and I. Poljarliev, J. Appl. Electrochem., 22, 978 (1992).
40. D. Stoychev, I. Vitanova, R. Bujukliev, N. Petkova, I. Popova, and I. Poljarliev, J. Appl. Electrochem., 22, 987 (1992).
41. S. D. Evans, A. Ulman, K. E. Goppert-Berarducciand, and L. J. Gerenser, J. Am. Chem. Soc., 113, 5866 (1991); M. Brust, P. M. Blass, and A. J. Bard, Langmuir, 13, 5602 (1997); T. Yamaguchi, R. Sakai, K. Takahashi, and T. Komura, Electrochim. Acta. 48, 589 (2003).
42. S. D. Evans, A. Ulman, K. E. Goppert-Berarducciand, and L. J. Gerenser, J. Am. Chem. Soc., 113, 5866 (1991); M. Brust, P. M. Blass, and A. J. Bard, Langmuir, 13, 5602 (1997); T. Yamaguchi, R. Sakai, K. Takahashi, and T. Komura, Electrochim. Acta. 48, 589 (2003).
43. S. D. Evans, A. Ulman, K. E. Goppert-Berarducciand, and L. J. Gerenser, J. Am. Chem. Soc., 113, 5866 (1991); M. Brust, P. M. Blass, and A. J. Bard, Langmuir, 13, 5602 (1997); T. Yamaguchi, R. Sakai, K. Takahashi, and T. Komura, Electrochim. Acta. 48, 589 (2003).
44. E. D. Eliadis, R. G. Nuzzo, A. A. Gewinn, and R. C. Alkire, J. Electrochem. Soc., 144, 96 (1997).
45. H. Hagenstron, M. J. Esplandiu, and D. M. Kolb, Langmuir, 17, 839 (2001).
46. O. Cavalleri, A. M. Bittner, H. Kind, K. Kern, and T. Greber, Z. Phys. Chem. (Munich), 208, 107 (1999).