Catalytic behavior of 3-mercapto-1-propane sulfonic acid on Cu electrodeposition and its effect on Cu film properties for CMOS device metallization

Journal of Electroanalytical Chemistry

Volumn 542, Issue , 2003, Pages 61-66

  Kim, Jae Jeong ^a   Kim, Soo Kil ^a   Kim, Yong Shik ^a  

^a Seoul National University   (South Korea)

Author keywords

3 Mercapto 1 propane sulfonic acid; Acceleration; Copper; Electrodeposition

Indexed keywords

ADSORPTION; ANNEALING; CATALYST ACTIVITY; CHEMICAL BONDS; CMOS INTEGRATED CIRCUITS; COPPER; DESORPTION; ELECTROCHEMISTRY; INORGANIC ACIDS; METALLIC FILMS; METALLIZING; OXIDATION; PARTICLE ACCELERATORS; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS;

SUPERFILLING;

ELECTRODEPOSITION;

EID: 0037472938     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(02)01450-X     Document Type: Article

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