SCOPUS 정보 검색 플랫폼

Nanoscale

Volumn 3, Issue 7, 2011, Pages 2730-2738

Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning

(3) Singer, Jonathan P a,b Kooi, Steven E b Thomas, Edwin L a,b

a USA (United States)

b MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3D STRUCTURE; ABSORBING DYE; CHEMICALLY AMPLIFIED PHOTORESIST; CHEMICALLY AMPLIFIED RESIST; COMBINED TECHNIQUES; DIRECT WRITE; EXPERIMENTAL SETUP; FOCUSED LASER; HIERARCHICAL STRUCTURES; HOT PLATES; INTERFERENCE LITHOGRAPHY; LAYER-BY-LAYERS; LENGTH SCALE; MICROSCALE PATTERNING; PHONONIC CRYSTAL; PHOTO-ACTIVATED; POSTEXPOSURE BAKE; PROCESSING METHOD; SIMULATED RESULTS; THERMAL ACTIVATION; UV-CROSSLINKING;

PHOTORESISTS; THREE DIMENSIONAL;

PHOTONIC CRYSTALS;

ARTICLE; LASER; NANOTECHNOLOGY;

LASERS; NANOTECHNOLOGY;

EID: 79960166438 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c1nr10050e Document Type: Article

Times cited : (21)

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