Profile simulation of SU-8 thick film resist

Journal of Photopolymer Science and Technology

Volumn 18, Issue 1, 2005, Pages 125-132

  Sensu, Yoshihisa ^a   Sekiguchig, Atsushi ^a   Kono, Yoshiyuki ^a   Mori, Satoshi ^b   Honda, Nao ^b   Weber, William D ^c  

^a Jpn   (Japan)

^b NIPPON KAYAKU CO LTD   (Japan)

^c MicroChem Corp   (United States)

Author keywords

Chemically amplified negative resist; Crosslink; Lithography simulation; Thick film resist

Indexed keywords

EID: 22144440136     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.18.125     Document Type: Article

References (16)

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