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Journal of Photopolymer Science and Technology

Volumn 12, Issue 5, 1999, Pages 695-710

Novel diffusion analysis in advanced chemically amplified DUV resists using photometric methods

(3) Richter, E a,b Hien, S a Sebald, M a

a UNIVERSITY OF REGENSBURG (Germany)

b INFINEON TECHNOLOGIES AG (Germany)

Author keywords

Acid diffusion; CARL; Chemical kinetics; Duv lithography; Indicator; Photoresist

Indexed keywords

EID: 0001156096 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.12.695 Document Type: Article

Times cited : (7)

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