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Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 647, Issue 1, 2011, Pages 125-131

Laser-plasma EUV source dedicated for surface processing of polymers

(6) Bartnik, A a Fiedorowicz, H a Jarocki, R a Kostecki, J a Szczurek, M a Wachulak, P W a

a MILITARY UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

EUV optics; Extreme ultraviolet; Laser plasma; Polymer processing

Indexed keywords

DIFFERENTIAL PUMPING; EUV OPTICS; EUV RADIATION; EUV SOURCE; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET SOURCES; FLUENCES; FOCAL PLANE; GAS PUFF TARGETS; GRAZING INCIDENCE; HIGH-VACUUM CONDITIONS; LASER PLASMA; LONG WAVELENGTH; POLYMER PROCESSING; POLYMER SAMPLES; POLYMER SURFACES; PULSED INJECTION; REACTIVE GAS; RESIDUAL GAS; SPECTRAL DISTRIBUTION; SURFACE PROCESSING; VACUUM CHAMBERS;

EXTREME ULTRAVIOLET LITHOGRAPHY; FOCUSING; GASES; HELIUM; KRYPTON; LASER PRODUCED PLASMAS; LIGHT SOURCES; OPTICAL PUMPING; PLASMA INTERACTIONS; POLYMERS; PUMPS; ULTRAVIOLET LASERS; VACUUM; XENON;

PULSED LASERS;

EID: 79958820925 PISSN: 01689002 EISSN: None Source Type: Journal
DOI: 10.1016/j.nima.2011.05.033 Document Type: Article

Times cited : (61)

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