Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

Microelectronic Engineering

Volumn 77, Issue 2, 2005, Pages 95-102

  López, E Vargas ^a   Jurczyk, B E ^a   Jaworski, M A ^a   Neumann, M J ^a   Ruzic, D N ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Debris mitigation; Dense plasma focus; DPF; EUV; Ionization fraction; Lithography; RF plasma; Secondary plasma

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTALS; ELECTRIC DISCHARGES; IONIZATION; LITHOGRAPHY; OSCILLATORS (ELECTRONIC); ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEBRIS MITIGATION; DENSE PLASMA FOCUS (DPF); EXTREME ULTRAVIOLET (EUV); IONIZATION FRACTION; RF PLASMA; SECONDARY PLASMA;

PLASMA THEORY;

EID: 12444305337     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.09.005     Document Type: Article

References (9)

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