A novel fast capillary discharge system emitting intense EUV radiation: Possible source for EUV lithography

Microelectronic Engineering

Volumn 65, Issue 1-2, 2002, Pages 47-59

  Mohanty, S R ^a,b   Robert, E ^b   Dussart, R ^b   Viladrosa, R ^b   Pouvesle, J M ^b   Fleurier, C ^b   Cachoncinlle, Christophe ^a  

^a Center of Plasma Physics Institute for Plasma Research   (India)

^b UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

Capillary discharge; EUV lithography; EUV pinhole camera; EUV source; EUV spectroscopy

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC DISCHARGES; IMAGING TECHNIQUES; PINCH EFFECT; PLASMA APPLICATIONS; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROMETERS;

CAPILLARY DISCHARGE SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0036893146     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00728-1     Document Type: Article

References (23)

1. Steden C., Kunze H.-J. Phys. Lett. A. 151:1990;534-537.
2. Rocca J.J., Marconi M.C., Tomasel F.G. IEEE J. Quantum Electron. 29:1993;182-191.
3. Rocca J.J., Shlyaptsev V.N., Tomasel F.G., Cortázar O.D., Hartshorn D., Chilla J.L.A. Phys. Rev. Lett. 73:1994;2192-2195.
4. Shin H.J., Kim D.E., Lee T.N. Phys. Rev. E. 50:1994;1367-1382.
5. Hebenstreit M., Fertner R., Neger T., Pockl M., Aumayr F. J. Phys. D. 29:1996;1933-1940.
6. Benware B.R., Moreno C.H., Burd D.J., Rocca J.J. Opt. Lett. 22:1997;796-798.
7. Tomasel F.G., Rocca J.J., Shlyaptsev V.N., Macchietto C.D. Phys. Rev. A. 55:1997;1437-1440.
8. Niimi G., Hayashi Y., Nakajima M., Watanabe M., Okino A., Horioka K., Hotta E. J. Phys. D. 34:2001;1-4.
9. Klosner M.A., Bender H.A., Silfvast W.T., Rocca J.J. Opt. Lett. 22:1997;34-36.
10. Klosner M.A., Silfvast W.T. Opt. Lett. 23:1998;1609-1611.
11. Krisch I., Choi P., Larour J., Favre M., Rous J., Leblanc C. Contrib. Plasma Phys. 40:2000;135-140.
12. Boboc T., Bischoff R., Langhoff H. J. Phys. D. 34:2001;2512-2517.
13. Lebert R., Bergmann K., Schriever G., Neff W. Microelectron. Eng. 46:1999;449-452.
14. Silfvast W.T. IEEE J. Quantum Electron. 35:1999;700-708.
15. Rosenfeld W., Dussart R., Richard N., Cachoncinlle C., Hong D., Pouvesle J.M., Fleurier C. Proceedings of the 6th International Conference on X-ray Lasers, Kyoto. Institute of Physics Conference Series No. 159. 1998;171-174.
16. Hong D., Dussart R., Cachoncinlle C., Rosenfeld W.E.S., Götze S., Pons J., Viladrosa R., Fleurier C., Pouvesle J.M. Rev. Sci. Instrum. 71:2000;15-19.
17. Robert E., Blagojevic B., Dussart R., Mohanty S.R., Idrissi M.M., Hong D., Viladrosa R., Pouvesle J.-M., Fleurier C., Cachoncinlle C. Proc. SPIE. 4343:2001;566-575.
18. Miyamoto T. Nucl. Fusion. 24:1984;337-348.
19. McGeoch M. Appl. Opt. 37:1998;1651-1658.
20. Dussart R., Hong D., Götze S., Rosenfeld W.E.S., Pons J., Viladrosa R., Cachoncinlle C., Fleurier C., Pouvesle J.-M. J. Phys. D. 33:2000;1837-1842.
21. Tomasel F.G., Rocca J.J., Shlyaptsev N.V. IEEE Trans. Plasma Sci. 24:1996;49-50.
22. Moreno C.H., Marconi M.C., Shlyaptsev V.N., Benware B.R., Macchietto C.D., Chilla J.L.A., Rocca J.J. Phys. Rev. A. 58:1998;1509-1514.
23. Partlo W.N., Fomenkov I.V., Ness R.M., Oliver R.I., Melnychuk S.T., Rau J.E. Proc. SPIE. 4343:2001;232-248.