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Applied Physics A: Materials Science and Processing

Volumn 98, Issue 1, 2010, Pages 61-65

PMMA and FEP surface modifications induced with EUV pulses in two selected wavelength ranges

(5) Bartnik, A a Fiedorowicz, H a Jarocki, R a Kostecki, J a Szczurek, M a

a MILITARY UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

EUV SOURCE; EXTREME ULTRAVIOLETS; FOCAL PLANE; GAS PUFF TARGETS; LASER PLASMA; LONG-WAVELENGTH TAIL; MICRO AND NANOSTRUCTURES; POLYMER SAMPLES; RADIATION FLUENCES; REPETITION RATE; SPECTRAL RANGE; SPECTRAL REGION; SURFACE MODIFICATION; WAVELENGTH RANGES;

CHEMICAL MODIFICATION; EXTREME ULTRAVIOLET LITHOGRAPHY; KRYPTON; LIGHT SOURCES; PHOTORESISTS; SURFACE TREATMENT; ZIRCONIUM;

ULTRAVIOLET DEVICES;

EID: 71149097885 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-009-5406-9 Document Type: Article

Times cited : (19)

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