Micromachining of organic polymers by X-ray photo-etching using a 10 Hz laser-plasma radiation source

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 452-456

  Bartnik, A ^a   Fiedorowicz, H ^a   Jarocki, R ^a   Juha, L ^b   Kostecki, J ^a   Rakowski, R ^a   Szczurek, M ^a  

^a MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Microstructures; Photo etching; X rays

Indexed keywords

ELECTROMAGNETIC WAVES; ETCHING; HIGH POWER LASERS; MICROMACHINING; MICROSTRUCTURE; RADIATION; X RAYS;

DIRECT PHOTO-ETCHING; LASER-PLASMA RADIATION SOURCE; METALLIC MASKS; PHOTO-ETCHING;

ORGANIC POLYMERS;

EID: 14944377743     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.058     Document Type: Conference Paper

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