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Volumn 519, Issue 18, 2011, Pages 5846-5853

Deposition and characterization of c-axis oriented aluminum nitride films by radio frequency magnetron sputtering without external substrate heating

(3) Singh, Atul Vir a Chandra, Sudhir a Bose, G b

a INDIAN INSTITUTE OF TECHNOLOGY DELHI (India)

b SIKSHA O ANUSANDHAN DEEMED TO BE UNIVERSITY (India)

Author keywords

Acoustic resonators; Aluminum nitride; Microelectromechanical systems; Radio frequency magnetron sputtering; Thin films; X ray diffraction

Indexed keywords

ALN; ALN FILMS; ALUMINUM NITRIDE FILMS; AMBIENT GAS; ATOMIC FORCE; CRYSTALLINITIES; DC RESISTIVITY; IR ABSORPTION; MICRO ELECTRO MECHANICAL SYSTEM; MIXED GAS; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RF-POWER; SPUTTERING PRESSURES; STRUCTURE AND MORPHOLOGY; SUBSTRATE HEATING;

ACOUSTIC RESONATORS; ALUMINUM; ALUMINUM NITRIDE; ARGON; ATOMIC FORCE MICROSCOPY; CHROMIUM; COMPOSITE MICROMECHANICS; CRYSTAL ATOMIC STRUCTURE; DC POWER TRANSMISSION; DIFFRACTION; ELECTRIC FIELDS; GOLD; GOLD COATINGS; HEATING; MAGNETRON SPUTTERING; MEMS; MICROELECTROMECHANICAL DEVICES; NITRIDES; PRESSURE EFFECTS; RADIO; RADIO WAVES; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION;

ALUMINUM COATINGS;

EID: 79958112482 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.02.074 Document Type: Article

Times cited : (45)

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