Influence of nitrogen concentration on grain growth, structural and electrical properties of sputtered aluminum nitride films

Scripta Materialia

Volumn 54, Issue 10, 2006, Pages 1755-1759

  Kar, J P ^a   Bose, G ^a   Tuli, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

AlN; Electrical properties; Microstructure; Sputtering

Indexed keywords

CONCENTRATION (PROCESS); ELECTRIC PROPERTIES; GRAIN GROWTH; MICROSTRUCTURE; NITROGEN; SPUTTERING; THIN FILMS;

NITROGEN CONCENTRATION; STRUCTURAL PROPERTIES;

ALUMINUM NITRIDE;

EID: 33644860633     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2006.01.038     Document Type: Article

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