Growth and characterization of high resistivity c-axis oriented ZnO films on different substrates by RF magnetron sputtering for MEMS applications

Journal of Materials Science

Volumn 42, Issue 12, 2007, Pages 4675-4683

  Singh, Ravindra ^a   Kumar, Mahesh ^a   Chandra, Sudhir ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FULL WIDTH AT HALF MAXIMUM; HEATING; MAGNETRON SPUTTERING; MEMS; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLOGRAPHIC PROPERTIES; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; GAS COMPOSITION;

ZINC OXIDE;

EID: 34547257967     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-006-0372-5     Document Type: Article

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