Structural and optical characterization of AlN films grown by pulsed laser deposition

Applied Surface Science

Volumn 248, Issue 1-4, 2005, Pages 411-415

  Ristoscu, C ^a   Ducu, C ^b   Socol, G ^a   Craciunoiu, F ^c   Mihailescu, I N ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b UNIVERSITY OF PITESTI   (Romania)

^c NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

AlN; Ellipsometry; FTIR in reflection; PLD

Indexed keywords

ALUMINUM NITRIDE; CRYSTAL STRUCTURE; ELLIPSOMETRY; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SURFACE ROUGHNESS; X RAY DIFFRACTION;

ALN; FTIR IN REFLECTION; SPECTROSCOPIC ELLIPSOMETRY (SE); VAPOR DISCHARGE;

THIN FILMS;

EID: 19944365901     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.112     Document Type: Conference Paper

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