Compositional and structural analysis of RF magnetron sputtered La3+-modified PZT thin films

Journal of Materials Processing Technology

Volumn 209, Issue 2, 2009, Pages 991-997

  Singh, Ravindra ^a   Chakraborty, B R ^b   Singh, Nahar ^b   Bahadur, Harish ^b   Goel, T C ^c   Chandra, Sudhir ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

^c BIRLA INSTITUTE OF TECHNOLOGY AND SCIENCE   (India)

Author keywords

PLZT thin films; Pure perovskite phase; RF magnetron sputtering; SIMS

Indexed keywords

ABSORPTION SPECTROSCOPY; ARGON; ATOMIC ABSORPTION SPECTROMETRY; ATOMIC SPECTROSCOPY; GRAVIMETRIC ANALYSIS; INERT GASES; LANTHANUM; MAGNETRON SPUTTERING; MAGNETRONS; MASS SPECTROMETRY; OXIDE MINERALS; PEROVSKITE; PIEZOELECTRIC TRANSDUCERS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; REAL TIME SYSTEMS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING LEAD COMPOUNDS; SOLIDS; STRUCTURAL ANALYSIS; TARGETS; THIN FILMS; X RAY ANALYSIS;

ANNEALING TEMPERATURES; CHEMICAL COMPOSITIONS; COMPOSITIONAL ANALYSIS; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; DEPTH PROFILES; EXTERNAL-; FLAME ATOMIC ABSORPTIONS; LEAD ZIRCONATE TITANATES; PLZT FILMS; PLZT THIN FILMS; PURE PEROVSKITE PHASE; PZT THIN FILMS; RF MAGNETRON SPUTTERING; RF MAGNETRONS; RF POWERS; SECONDARY ION MASS SPECTROSCOPIES; SIMS; SOLID-STATE REACTIONS; STANDARD SAMPLES; SUBSTRATE HEATING; X-RAY DIFFRACTIONS;

FILM PREPARATION;

EID: 58149156695     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.03.009     Document Type: Article

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