Multilayer amorphous hydrogenated carbon (a-C:H) and SiOx doped a-C:H films for optical applications

Thin Solid Films

Volumn 519, Issue 12, 2011, Pages 4004-4007

  Tamulevičiene, Asta ^a   Meškinis, Šarunas ^a   Kopustinskas, Vitoldas ^a   Tamulevičius, Sigitas ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Antireflective film; Multilayer structures; SiOx doped a C:H

Indexed keywords

A-C:H FILMS; ACETYLENE GAS; AMORPHOUS HYDROGENATED CARBON (A-C:H); AMORPHOUS HYDROGENATED CARBON (A-C:H) FILMS; ANTIREFLECTIVE FILMS; BAND GAPS; CRYSTALLINE SILICONS; DEPOSITION ENERGY; HEXAMETHYL DISILOXANE; HYDROGEN TRANSPORT; ION BEAM DEPOSITION; ION BEAM ENERGY; MULTILAYER STRUCTURES; OPTICAL APPLICATIONS; SIOX DOPED A-C:H; SOLAR-CELL APPLICATIONS; UV-VIS-NIR; WAVELENGTH RANGES;

ACETYLENE; AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CHEMICAL MODIFICATION; HYDROGENATION; ION BEAMS; MULTILAYERS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; SILICON COMPOUNDS; SILICON OXIDES;

OPTICAL FILMS;

EID: 79953714237     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.181     Document Type: Article

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