Plasma deposition and characterization of silicon oxide-containing diamond-like carbon films obtained from CH4:SiH4:O2 gas mixtures

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 1890-1897

  Damasceno, J C ^a   Camargo Jr , S S ^a  

^a FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

DLC; DLC SiOx; Nanocomposites; Oxygen incorporation in DLC; Plasma deposition

Indexed keywords

BIAS VOLTAGE; CARBON FILMS; PLASMA DEPOSITION; POLYCARBONATES; REFRACTIVE INDEX;

GASEOUS MIXTURES; SCRATCH HARDNESS;

SILICON COMPOUNDS;

EID: 38749118629     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.119     Document Type: Article

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