Plasma modification of polycarbonates

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 449-454

  Zajickova L ^a   Bursikova V ^a   Perina V ^b   Mackova A ^b   Subedi, D ^a   Janca J ^a   Smirnov, S ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

B Ellipsometry; B Rutherford backscattering spectroscopy; C PACVD; C Sputtering; D Silicon oxide; X Polycarbonate

Indexed keywords

DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTIC FILMS; PROTECTIVE COATINGS; SILICA; STRESS ANALYSIS; TENSILE STRESS;

OPTICAL CONSTANTS;

POLYCARBONATES;

COATING; INDUSTRIAL APPLICATION; PLASMA TREATMENT; POLYCARBONATE; PROTECTION; SPUTTERING;

EID: 0035387346     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01134-3     Document Type: Article

References (13)