Deposition of organosilicon thin films using a remote thermal plasma

Thin Solid Films

Volumn 449, Issue 1-2, 2004, Pages 52-62

  Van Hest, M F A M ^a   Mitu, B ^a   Schram, D C ^a   Van de Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Deposition process; Expanding thermal plasma; Hexamethyldisiloxane; Silicon oxide

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; DISSOCIATION; MELTING; ORGANOMETALLICS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON; SUBSTRATES; SURFACE CHEMISTRY; THERMAL EFFECTS;

DEPOSITION PROCESS; EXPANDING THERMAL PLASMA; HEXAMETHYLDISILOXANE;

THIN FILMS;

EID: 1242265532     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01398-1     Document Type: Article

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