DLC-SiOx nanocomposite films deposited from CH4 : SiH4 : O2 gas mixtures

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6279-6282

  Damasceno, J C ^a   Camargo Jr , S S ^a  

^a FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Amorphous carbon; Carbon alloys; DLC; Nanocomposites

Indexed keywords

CONTACT ANGLE; DEPOSITION; ETCHING; HARDNESS; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SILICON COMPOUNDS;

AMORPHOUS CARBON; CARBON ALLOYS; GAS MIXTURE COMPOSITION; HIGH OPTICAL GAP COATINGS; NANOCOMPOSITE FILMS; SELF-BIAS VOLTAGE;

NANOSTRUCTURED MATERIALS;

CONTACT ANGLE; DEPOSITION; ETCHING; HARDNESS; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SILICON COMPOUNDS;

EID: 33646154445     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.049     Document Type: Article

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