Correlation between SiOx content and properties of DLC:SiOx films prepared by PECVD

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 281-285

  Zajickova L ^a   Bursikova V ^a   Perina V ^b   Mackova A ^b   Janca J ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

Diamond like carbon; PECVD; Rutherford backscattering spectroscopy; Silicon; Vickers hardness test

Indexed keywords

ELLIPSOMETRY; METHANE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; THICKNESS CONTROL;

FLOW RATE;

DIAMOND LIKE CARBON FILMS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 3042792082     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00681-9     Document Type: Article

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