Tin-catalyzed plasma-assisted growth of silicon nanowires

Journal of Physical Chemistry C

Volumn 115, Issue 10, 2011, Pages 3833-3839

  Rathi, Somilkumar J ^a   Jariwala, Bhavin N ^a   Beach, Joseph D ^a   Stradins, Paul ^b   Taylor, P Craig ^a   Weng, Xiaojun ^c   Ke, Yue ^c   Redwing, Joan M ^c   Agarwal, Sumit ^a   Collins, Reuben T ^a  

^a Department of Geology and Geological Engineering   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^c PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AXIAL GROWTH; CRYSTALLINE CORE; DEVICE APPLICATION; GROWTH TIME; HYDROGEN DILUTION; HYDROGEN PLASMAS; IN-SITU; NANOWIRE ARRAYS; PLASMA-ASSISTED GROWTH; POLYCRYSTALLINE SHELLS; PROCESS VARIABLES; RADIAL GROWTH; SILICON NANOWIRES; SYSTEMATIC STUDY; VAPOR-LIQUID-SOLID GROWTH; VAPOR-SOLID; WIRE GROWTH; WIRE LENGTH;

CATALYSIS; CHEMICAL ANALYSIS; HYDROGEN; NANOWIRES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; TIN; VAPORS; WIRE;

PLASMA DEPOSITION;

EID: 79953179743     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1066428     Document Type: Article

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