Sn etching with hydrogen radicals to clean EUV optics

Chemical Physics Letters

Volumn 484, Issue 4-6, 2010, Pages 197-199

  van Herpen, M M J W ^a   Klunder, D J W ^a   Soer, W A ^a   Moors, R ^b   Banine, V ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COLLECTOR OPTICS; ETCH RATES; EUV LITHOGRAPHY; EUV MIRRORS; EUV OPTICS; EXTREME ULTRAVIOLETS; HYDROGEN RADICAL; MAXIMUM VALUES; ORDERS OF MAGNITUDE;

ULTRAVIOLET DEVICES;

TIN;

EID: 72649105485     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2009.11.030     Document Type: Article

References (9)

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