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Volumn 989, Issue , 2007, Pages 537-542
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Silicon nanowires: Growth studies using pulsed PECVD
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Author keywords
[No Author keywords available]
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Indexed keywords
CATALYSTS;
GROWTH RATE;
MORPHOLOGY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
PULSED PECVD;
SILICON NANOWIRES;
SUBSTRATE TEMPERATURES;
VAPOR LIQUID SOLID (VLS) MECHANISM;
NANOWIRES;
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EID: 41549118116
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-0989-a23-03 Document Type: Conference Paper |
Times cited : (10)
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References (12)
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