Si nanowire growth and characterization using a microelectronics-compatible catalyst: PtSi

Applied Physics Letters

Volumn 89, Issue 23, 2006, Pages

  Baron, T ^a   Gordon, M ^a   Dhalluin, F ^a   Ternon, C ^a   Ferret, P ^b   Gentile, P ^c  

^a Joseph Fourier University   (France)

^b CEA LETI   (France)

^c CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSTS; CHEMICAL VAPOR DEPOSITION; MICROELECTRONICS; PLATINUM COMPOUNDS; SILICON;

ELECTRICAL TESTING; MICROELECTRONICS COMPATIBLE CATALYSTS; NANOWIRE GROWTH; WIRE SIDEWALLS;

NANOSTRUCTURED MATERIALS;

EID: 33845396934     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2402118     Document Type: Article

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