The atomic hydrogen flux to silicon growth flux ratio during microcrystalline silicon solar cell deposition

Applied Physics Letters

Volumn 93, Issue 11, 2008, Pages

  Dingemans, G ^a,b   Van Den Donker, M N ^a,b,c   Hrunski, D ^a   Gordijn, A ^a   Kessels, W M M ^b   Van De Sanden, M C M ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c Solland Solar Cells BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CELL GROWTH; CHEMICAL VAPOR DEPOSITION; DIRECT ENERGY CONVERSION; FILM GROWTH; HYDROGEN; NONMETALS; SILICON; SILICON SOLAR CELLS; SOLAR ENERGY; SOLAR POWER GENERATION;

ATOMIC HYDROGEN; GROWTH FLUX; HIGH-PRESSURE DEPLETION; MICROCRYSTALLINE SILICON SOLAR CELLS; PROCESS PARAMETERS; PRODUCT DETECTION; SILICON GROWTH; SILICON THIN FILMS;

MICROCRYSTALLINE SILICON;

EID: 52349087968     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2987519     Document Type: Article

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