Non-intrusive plasma diagnostics for the deposition of large area thin film silicon

Thin Solid Films

Volumn 517, Issue 23, 2009, Pages 6218-6224

  Howling, A A ^a   Strahm, B ^a   Hollenstein, Ch ^a  

^a EPFL   (Switzerland)

Author keywords

Microcrystalline silicon; Plasma processing and deposition; Silane

Indexed keywords

FOURIER TRANSFORM INFRARED ABSORPTION SPECTROSCOPY; GAS UTILIZATION; HIGH DEPOSITION RATES; MICROCRYSTALLINITY; NON-INTRUSIVE; OPTIMAL REACTOR; PARALLEL PLATES; PLASMA CHEMISTRIES; PLASMA CHEMISTRY MODELS; PLASMA PARAMETER; PLASMA PROCESSING AND DEPOSITION; PROCESS OPTIMIZATION; PUMPING LINES; SHOWERHEAD; SILICON THIN FILM; THIN FILM SILICON; TIME RESOLVED OPTICAL EMISSION SPECTROSCOPY;

ABSORPTION SPECTROSCOPY; CHEMISTRY; DEPOSITION; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS ABSORPTION; MICROCRYSTALLINE SILICON; OPTICAL EMISSION SPECTROSCOPY; OPTIMIZATION; PLASMA DEVICES; PLASMA DIAGNOSTICS; PLASMA PROBES; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILANES; THIN FILM DEVICES; THIN FILMS;

PLASMA DEPOSITION;

EID: 68349083584     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.053     Document Type: Article

References (29)

1. Meier J., Flückiger R., Keppner H., and Shah A. Appl. Phys. Lett. 65 (1994) 860
2. Kroll U., Meier J., Torres P., Pohl J., and Shah A. J. Non-Cryst. Solids 227-230 (1998) 68
3. Rech B., Repmann T., van den Donker M.N., Berginski M., Kilper T., Hüpkes J., Calnan S., Stiebig H., and Wieder S. Thin Solid Films 511-512 (2006) 548
4. Pinto N., Ficcadenti M., Morresi L., Murri R., Ambrosone G., and Coscia U. J. Appl. Phys. 96 (2004) 7306
5. Fukawa M., Suzuki S., Guo L., Kondo M., and Matsuda A. Sol. Energy Mater. Sol. Cells 66 (2001) 217
6. Shah A., Meier J., Vallat-Sauvain E., Wyrsch N., Kroll U., Droz C., and Graf U. Sol. Energy Mater. Sol. Cells 78 (2003) 469
7. Terasa R., Albert M., Grüger H., Haiduk A., and Kottwitz A. J. Non-Cryst. Solids 266-269 (2000) 95
8. Qing-Song L., Zhi-Meng W., Xin-Hua G., Ying Z., and Jian-Ping X. Chin. Phys. 14 (2005) 2342
9. Kočka J., Mates T., Stucklíková H., Stuchlík J., and Fejfar A. Thin Solid Films 501 (2006) 107
10. van den Donker M.N., Rech B., Finger F., Kessels W.M.M., and van de Sanden M.C.M. Appl. Phys. Lett. 87 (2005) 263503
11. Strahm B., Howling A.A., Sansonnens L., Hollenstein C., Kroll U., Meier J., Ellert C., Feitknecht L., and Ballif C. Sol. Energy Mater. Sol. Cells 91 (2007) 495
12. Howling A.A., Sansonnens L., Ballutaud J., Grangeon F., Delachaux T., Hollenstein C., Daudrix V., and Kroll U. 16th European Photovoltaic Solar Energy Conf. (Glasgow, UK) VB1 (2000) 28
13. Leempoel P., Descamps P., Kervyn de Meerendré T., Charliac J., Roca i Cabarrocas P., Bulkin P., Daineka D., Dao T.H., Kleider J.P., Gueunier-Farret M.E., and Longeaud C. Thin Solid Films 516 (2008) 6853
14. Roca i Cabarrocas P., Bulkin P., Daineka D., Dao T.H., Leempoel P., Descamps P., Kervyn de Meerendré T., and Charliac J. Thin Solid Films 516 (2008) 6834
15. Strahm B., Howling A.A., Sansonnens L., and Hollenstein C. Plasma Sources Sci. Technol. 16 (2007) 80
16. Howling A.A., Strahm B., Colsters P., Sansonnens L., and Hollenstein C. Plasma Sources Sci. Technol. 16 (2007) 679
17. Strahm B., Howling A.A., Sansonnens L., and Hollenstein C. J. Vac. Sci. Technol. A 25 (2007) 1198
18. Amanatides E., Hammad A., Katsia E., and Mataras D. J. Appl. Phys. 97 (2005) 073303
19. Sansonnens L., Howling A.A., and Hollenstein C. Plasma Sources Sci. Technol. 9 (2000) 205
20. Shirai H., and Arai T. J. Non-Cryst. Solids 198-200 (1996) 931
21. Matsuda A. Thin Solid Films 337 (1999) 1
22. Terasa R., Albert M., Bartha J., Brechtel H., and Kottwitz A. J. Non-Cryst. Solids 299-302 (2002) 58
23. Matsuda A. J. Non-Cryst. Solids 338-340 (2004) 1
24. Feitknecht L., Meier J., Torres P., Zürcher J., and Shah A. Sol. Energy Mater. Sol. Cells 74 (2002) 539
25. Strahm B., Howling A.A., and Hollenstein C. Plasma Phys. Control. Fusion 49 (2007) B411
26. Kilper T., van den Donker M.N., Carius R., Rech B., Bräuer G., and Repmann T. Thin Solid Films 516 (2008) 4633
27. Fantz U. Plasma Phys. Control. Fusion 40 (1998) 1035
28. Perrin J., and Schmitt J.P.M. Chem. Phys. 67 (1982) 167
29. van den Donker M.N., Rech B., Kessels W.M.M., and van de Sanden M.C.M. New J. Phys. 9 (2007) 280