Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface

Physical Review Letters

Volumn 90, Issue 13, 2003, Pages

  Yang, W C ^a   Zeman, M ^a   Ade, H ^a   Nemanich, R J ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; COMPUTER SIMULATION; ELECTRON MICROSCOPY; FREE ELECTRON LASERS; INTERFACIAL ENERGY; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SPONTANEOUS EMISSION; SURFACES; TITANIUM ALLOYS; ULTRAVIOLET RADIATION;

GIBBS-THOMSON RELATION; PHOTOELECTRON EMISSION MICROSCOPY; SOLID-ISLAND DIFFUSION; SURFACE CONCENTRATION; ULTRAVIOLET FREE ELECTRON LASER;

DIFFUSION IN SOLIDS;

EID: 1142267589     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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