Nanoindentation of laser micromachined 3C-SiC thin film micro-cantilevers

Materials and Design

Volumn 32, Issue 6, 2011, Pages 3414-3420

  Pecholt, Ben ^a   Molian, Pal ^a  

^a Iowa State University   (United States)

Author keywords

A. Semi conductors; B. Thin film; C. Laser machining

Indexed keywords

ATMOSPHERIC CHEMICAL VAPOR DEPOSITIONS; AVERAGE POWER; B. THIN FILM; C. LASER MACHINING; DIRECT-WRITING; ETCH RATES; FRACTURE STRENGTHS; FUNDAMENTAL WAVELENGTH; ION ETCHING; LASER PATTERNING; LOAD CURVES; MICRO-CANTILEVERS; MICROMACHINED; NANOINDENTATION TESTS; PULSE DURATIONS; Q SWITCHED ND:YAG LASER; SEMI CONDUCTOR; SI (100) SUBSTRATE; SIC THIN FILMS; SINGLE-CRYSTALLINE THIN FILMS; WET-CHEMICAL ETCHING; YOUNG'S MODULUS;

ANISOTROPIC ETCHING; CANTILEVER BEAMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; MACHINING; NANOCANTILEVERS; NANOINDENTATION; POTASSIUM HYDROXIDE; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; THIN FILMS; WET ETCHING;

NEODYMIUM LASERS;

EID: 79953162471     PISSN: 02641275     EISSN: 18734197     Source Type: Journal    
DOI: 10.1016/j.matdes.2011.02.006     Document Type: Article

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