Elasto-viscoplastic response of silicon to femtosecond laser heating at elevated temperature

Journal of Thermal Stresses

Volumn 34, Issue 2, 2011, Pages 115-137

  Qi, Xuele ^a   Suh, C Steve ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

Elasto viscoplastic response; Femtosecond laser; Hyperbolic energy transport dynamics; Single crystalline silicon

Indexed keywords

ANNEALING TEMPERATURES; COMPUTATIONAL SCHEMES; CONSTITUTIVE LAW; ELASTO-VISCOPLASTIC; ELEVATED TEMPERATURE; FEMTO-SECOND LASER; FLUENCE THRESHOLDS; FREQUENCY SPECTRA; HYPERBOLIC ENERGY; LONGITUDINAL DISPLACEMENTS; MECHANICAL RESPONSE; NONTHERMAL; NORMAL STRESS; OPTICAL HEATING; OSCILLATION AMPLITUDE; PHYSICAL DATA; PLASTIC RESPONSE; SILICON MATERIALS; SINGLE CRYSTALLINE SILICON; THERMAL RESOLUTION; ULTRA-FAST;

CRYSTALLINE MATERIALS; DYNAMICS; HEATING; LASER HEATING; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPY; ULTRASHORT PULSES; VISCOELASTICITY;

SILICON WAFERS;

EID: 78651395996     PISSN: 01495739     EISSN: 1521074X     Source Type: Journal    
DOI: 10.1080/01495739.2010.511935     Document Type: Article

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